In situ nanoprobing and SEM based current imaging techniques are proven methods used in the semiconductor industry to characterize an integrated circuit or precisely localize defects in it. This workshop aims to share recent advances and practical results within the community, providing both talks and an in situ live demonstration at the Fraunhofer CAM facilities.
Date: Tuesday, April 24th, 2018
Time: 3pm to 6pm
Location: main building of Fraunhofer IMWS, seminar room, Walter-Huelse-Strasse 1, 06120 Halle (Saale)
List of presentations:
Challenges around nanoprobing and electron beam induced imaging techniques, Jörg Jatzkowski – Fraunhofer Institute for Microstructure of Materials and Systems IMWS
When chemistry can help for a better sample preparation, Gregory Goupil – Orsay Physics (Tescan Orsay Holding)
Getting stable electrical contacts, a challenge to overcome for testing ICs with technology node below 65nm, Guillaume Boetsch – Imina Technologies SA
Resistance mapping in SEM with EBAC/RCI, Grigore Moldovan – point electronic GmbH
Parametric semiconductor characterization, Artjom Bergmann – Keithey Instruments (a Tektronix Company)
Please get in touch with Guillaume Boetsch for more Information.